photomask

简明释义

英[ˈfoʊtəʊˌmæsk]美[ˈfoʊtəʊˌmæsk]

n. 光罩；[电子] 光掩模

英英释义

单词用法

同义词

反义词

例句

1.So the measurement and control in the feature size of photomask can reduce the reject of IC and research on this area is very meaningful.

对掩模特征尺寸及缺陷进行检测可以减少集成电路的废品率，因此开展这方面的研究具有重要意义。

2.In order to repair the clear defects of photomask, photolytic LCVD process is required to initiate the chemical reactions.

为了对透明光掩模亮场区域进行修补，需要光化学解离过程诱导反应发生；

3.Some industrial applications including micromachining dynodes of photomultipliers, repairing photomask of lithography, fabricating array micro-holes in incandescent filaments, etc. are introduced.

介绍了飞秒激光加工光电倍增管电极，修复光刻掩膜，诱导白炽灯丝阵列微孔等一些工业应用。

4.Compared with the well known manufacturing method of a pixel structure, the invention can simplify processing steps and reduces the manufacturing cost of photomask.

本发明相比于公知的像素结构制作方法，可以简化工艺步骤并减少光掩模的制作成本。

5.A photomask is an essential component for semiconductor manufacturing and microfabrication.

光掩膜是半导体和精密加工的必要成分。

6.E-beam tools are used in photomask writing, but many believe the technology will never be fast enough for high-volume semiconductor lithography.

因此目前电子束光刻设备主要的用途是用于刻制掩膜板，许多人甚至认为电子束光刻技术的产出量永远也无法满足芯片量产的需求。

7.This paper describes the maskless wiring formation technology not using photomask and photoresist, development of metal nano particle and nano ink, application of the inkjet method and future theme.

概述了不使用光致掩模和光致抗蚀剂的无掩模布线形成技术，金属纳米粒子和纳米油墨的研究开发，喷墨法的应用和今后的课题。

8.The initial experiments on and analysis of sheet resistance, contact, photomask alignment, line width, and correlations between device parameters and dopants have been made.

对薄层电阻、接触、光掩模对准、线条宽度、器件参数与掺杂的相关性等内容进行了初步试验和分析。

9.The engineer carefully inspected the photomask to ensure there were no defects before the lithography process.

工程师仔细检查了光掩模，以确保在光刻过程中没有缺陷。

10.In semiconductor manufacturing, a photomask is essential for defining circuit patterns on silicon wafers.

在半导体制造中，光掩模是定义硅晶圆上电路图案的关键。

11.The quality of the photomask directly impacts the performance of the final product.

光掩模的质量直接影响最终产品的性能。

12.During the photolithography process, the light passes through the photomask to transfer the pattern onto the substrate.

在光刻过程中，光线通过光掩模将图案转移到基材上。

13.A cleanroom environment is crucial for the production of photomasks to prevent contamination.

为了防止污染，生产光掩模的无尘室环境至关重要。

作文

In the world of semiconductor manufacturing, the term photomask refers to a crucial component used in the photolithography process. A photomask is essentially a glass or quartz plate that has been coated with an opaque material, typically chrome, and it contains the patterns that will be transferred onto a semiconductor wafer. The importance of the photomask cannot be overstated, as it directly influences the performance and characteristics of the final microelectronic devices. The process begins when light is shone through the photomask, which selectively allows the light to pass through the transparent areas while blocking it in others. This light exposure creates a latent image on the photoresist layer applied to the wafer. After exposure, the wafer undergoes a development process where the exposed photoresist is either removed or retained, depending on whether a positive or negative photoresist is used. This step is critical as it determines the accuracy and fidelity of the pattern transfer from the photomask to the wafer. One of the key challenges in using a photomask is ensuring that the patterns are scaled correctly and that they maintain their integrity during the transfer process. Any imperfections in the photomask can lead to defects in the semiconductor devices, which can significantly affect their functionality. Therefore, manufacturers invest heavily in the design and fabrication of photomasks to achieve the highest level of precision possible. Moreover, as technology advances, the demand for smaller and more complex semiconductor devices has increased, leading to the need for advanced photomask technologies. For instance, techniques such as double patterning and extreme ultraviolet (EUV) lithography have emerged, necessitating the development of new types of photomasks that can handle these intricate processes. These innovations not only improve the resolution but also enhance the overall efficiency of semiconductor manufacturing. In addition to their technical significance, photomasks also play a vital role in the economic aspects of semiconductor production. The cost of producing high-quality photomasks can be substantial, often reaching millions of dollars due to the complex processes involved in their creation. This investment is justified by the fact that a single photomask can be used to produce thousands of chips, making it a critical asset in the production line. In conclusion, the photomask is an indispensable tool in the realm of semiconductor manufacturing. Its role in the photolithography process is fundamental to the creation of modern electronic devices. As the industry continues to evolve, so too will the technologies surrounding photomasks, ensuring that they remain at the forefront of semiconductor innovation. Understanding the intricacies of photomasks not only highlights their importance in technology but also showcases the remarkable advancements in manufacturing techniques that drive the electronics industry forward.

在半导体制造的世界中，术语photomask指的是光刻过程中使用的一个关键组件。photomask本质上是一个涂有不透明材料（通常为铬）的玻璃或石英板，它包含将被转移到半导体晶圆上的图案。photomask的重要性不容小觑，因为它直接影响最终微电子设备的性能和特性。 这个过程始于通过photomask照射光线，光线选择性地通过透明区域，而在其他地方被阻挡。这种光曝光在施加到晶圆上的光刻胶层上创建了潜影图像。曝光后，晶圆经过显影过程，在此过程中，暴露的光刻胶要么被去除，要么被保留，这取决于使用的是正光刻胶还是负光刻胶。这一步骤至关重要，因为它决定了从photomask到晶圆的图案转移的准确性和保真度。 使用photomask时面临的主要挑战之一是确保图案正确缩放，并且在转移过程中保持其完整性。photomask中的任何缺陷都可能导致半导体设备出现缺陷，这会显著影响其功能。因此，制造商在photomask的设计和制造上投入大量资金，以实现尽可能高的精度。 此外，随着技术的进步，对更小和更复杂的半导体设备的需求增加，导致对先进photomask技术的需求。例如，双重成像和极紫外（EUV）光刻等技术的出现，需要开发新的类型的photomask，以处理这些复杂的过程。这些创新不仅提高了分辨率，还增强了半导体制造的整体效率。 除了技术意义外，photomask在半导体生产的经济方面也发挥着重要作用。生产高质量photomask的成本可能相当可观，通常达到数百万美元，因为其制作涉及复杂的工艺。这项投资是合理的，因为单个photomask可以用于生产数千个芯片，使其成为生产线中的关键资产。 总之，photomask是半导体制造领域不可或缺的工具。它在光刻过程中的角色对于现代电子设备的创建至关重要。随着行业的不断发展，围绕photomask的技术也将不断演变，确保它们在半导体创新的最前沿。理解photomask的复杂性不仅突显了它们在技术中的重要性，也展示了推动电子行业向前发展的制造技术的显著进步。